SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS

被引：63

作者：

GAUTHERIN, G

WEISSMANTEL, C

机构：

来源：

THIN SOLID FILMS | 1978年 / 50卷 / MAY期

关键词：

D O I：

10.1016/0040-6090(78)90099-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：135 / 144

页数：10

共 36 条

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[3]

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[5]

AMANO J, 1977, J VAC SCI TECHNOL, V14, P836, DOI 10.1116/1.569281

[6] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN [J].

AMANO, J ;

BRYCE, P ;

LAWSON, RPW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (02) :591-595

[7] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].

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[8]

Carter G., 1968, ION BOMBARDMENT SOLI

[9]

CASTELLANO RN, 1977, COMMUNICATION

[10]

COLLIGON JS, 1976, 1975 P INT C APPL IO, P357

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