THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .1. SYSTEM SPECIFICATION AND DESIGN

被引：50

作者：

AMANO, J ^{[1
]}

BRYCE, P ^{[1
]}

LAWSON, RPW ^{[1
]}

机构：

[1] UNIV ALBERTA,DEPT ELECT ENGN,EDMONTON,ALBERTA,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 02期

关键词：

Compendex;

D O I：

10.1116/1.569040

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

FILMS

引用

页码：591 / 595

页数：5

共 18 条

[1]

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[2]

ANDREW R, UNPUBLISHED

[3]

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COBURN, JW ;

ECKSTEIN, EW ;

KAY, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :151-154

[5]

COLLIGON JS, 1975, SEP P INT C APPL ION

[6] LASER-INDUCED DAMAGE IN OPTICAL MATERIALS - 6TH ASTM SYMPOSIUM [J].

GLASS, AJ ;

GUENTHER, AH .

APPLIED OPTICS, 1975, 14 (03) :698-715

[7]

LEWIN G, 1965, FUNDAMENTALS VACUUM, P39

[8]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[9]

MATTOX DM, 1973, SPUTTER DEPOSITION I

[10]

MAYER DE, 1974, J VAC SCI TECHNOL, V11, P168