THIN-FILM ANNEALING BY ION-BOMBARDMENT

被引：90

作者：

HIRSCH, EH

VARGA, IK

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(80)90207-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：99 / 105

页数：7

共 7 条

[1] ON THE NATURE OF RADIATION DAMAGE IN METALS
BRINKMAN, JA
[J]. JOURNAL OF APPLIED PHYSICS, 1954, 25 (08) : 961 - 970
[2] Brinkman JA, 1956, AM J PHYS, V24, P246, DOI [10.1119/1.1934201, DOI 10.1119/1.1934201]
[3] ANNEALING OF BOMBARDMENT DAMAGE IN GERMANIUM - EXPERIMENTAL
BROWN, WL
FLETCHER, RC
WRIGHT, KA
[J]. PHYSICAL REVIEW, 1953, 92 (03): : 591 - 596
[4] EFFECT OF ION IRRADIATION ON ADHERENCE OF GERMANIUM FILMS
HIRSCH, EH
VARGA, IK
[J]. THIN SOLID FILMS, 1978, 52 (03) : 445 - 452
[5] SELF-DIFFUSION IN GERMANIUM
LETAW, H
PORTNOY, WM
SLIFKIN, L
[J]. PHYSICAL REVIEW, 1956, 102 (03): : 636 - 639
[6] SEITZ F, 1956, SOLID STATE PHYS, V2, P305
[7] GAS INCORPORATION INTO SPUTTERED FILMS
WINTERS, HF
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (10) : 3928 - &