UNBALANCED MAGNETRON ION-ASSISTED DEPOSITION AND PROPERTY MODIFICATION OF THIN-FILMS

被引：139

作者：

SAVVIDES, N

WINDOW, B

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573869

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：504 / 508

页数：5

共 30 条

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[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) : 550 - 555
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[6] THIN SOLID FILMS TO COMBAT FRICTION, WEAR, AND CORROSION
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 816 - 822
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[8] THE EFFECTS OF SUBSTRATE BIAS ON THE STRUCTURAL AND ELECTRICAL-PROPERTIES OF TIN FILMS PREPARED BY REACTIVE RF SPUTTERING
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[J]. THIN SOLID FILMS, 1980, 70 (01) : 17 - 25
[9] GROWTH AND PROPERTIES OF SINGLE-CRYSTAL TIN FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
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BARNETT, SA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (02): : 303 - 307
[10] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736

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