UNBALANCED MAGNETRON ION-ASSISTED DEPOSITION AND PROPERTY MODIFICATION OF THIN-FILMS

被引：139

作者：

SAVVIDES, N

WINDOW, B

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573869

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：504 / 508

页数：5

共 30 条

[21] DEPOSITION OF HARD WEAR-RESISTANT COATINGS BY REACTIVE DC PLASMATRON SPUTTERING
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SIEBER, W
[J]. THIN SOLID FILMS, 1984, 118 (03) : 255 - 270
[22] ION-SURFACE INTERACTIONS DURING THIN-FILM DEPOSITION
TAKAGI, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 382 - 388
[23] INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS
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[24] Toth L.E, 1971, TRANSITION METAL CAR
[25] PREPARATION AND PROPERTIES OF HARD I-C AND I-BN COATINGS
WEISSMANTEL, C
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ERLER, HJ
RAU, B
REISSE, G
[J]. THIN SOLID FILMS, 1982, 96 (01) : 31 - 44
[26] ION-BEAM DEPOSITION OF SPECIAL FILM STRUCTURES
WEISSMANTEL, C
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 179 - 185
[27] STRUCTURE AND PROPERTIES OF QUASI-AMORPHOUS FILMS PREPARED BY ION-BEAM TECHNIQUES
WEISSMANTEL, C
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[J]. THIN SOLID FILMS, 1980, 72 (01) : 19 - 31
[28] CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES
WINDOW, B
SAVVIDES, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02): : 196 - 202
[29] UNBALANCED DC MAGNETRONS AS SOURCES OF HIGH ION FLUXES
WINDOW, B
SAVVIDES, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 453 - 456
[30] MAGNETICALLY CONFINED SPUTTER SOURCE WITH HIGH ION FLUX
WINDOW, B
SHARPLES, F
SAVVIDES, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2368 - 2372

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