共 14 条
- [1] Bohm D., 1949, CHARACTERISTICS ELEC, P13
- [2] EPITAXIAL CRYSTAL-GROWTH BY SPUTTER DEPOSITION - APPLICATIONS TO SEMICONDUCTORS .1. [J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1983, 11 (01): : 47 - 97
- [4] KIEFFER LJ, 1973, JILA13 U COL INF CTR
- [7] USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J]. THIN SOLID FILMS, 1977, 40 (JAN) : 327 - 334
- [8] VERY HIGH-RATE REACTIVE SPUTTERING OF TIN, ZRN AND HFN [J]. THIN SOLID FILMS, 1983, 107 (02) : 141 - 147
- [9] Thornton J.A., 1978, THIN FILM PROCESS, V4, P75
- [10] MAGNETRON SPUTTERING - BASIC PHYSICS AND APPLICATION TO CYLINDRICAL MAGNETRONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 171 - 177