VERY HIGH-RATE REACTIVE SPUTTERING OF TIN, ZRN AND HFN

[1] PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION [J]. THIN SOLID FILMS, 1980, 72 (03) : 535 - 540

[2] LAENG P, 1981, 8TH P INT C CHEM VAP, P723

[3] ADHESION STUDIES OF ION-PLATED TIN ON STEEL [J]. THIN SOLID FILMS, 1981, 81 (04) : 357 - 366

[4] THE ADHESION OF CHEMICALLY VAPOUR-DEPOSITED HARD COATINGS TO STEEL - THE SCRATCH TEST [J]. THIN SOLID FILMS, 1981, 78 (01) : 77 - 93

[5] PERRY AJ, 1981, 8TH P INT C CHEM VAP, P475

[6] ADVANCES IN HIGH-RATE SPUTTERING WITH MAGNETRON-PLASMATRON PROCESSING AND INSTRUMENTATION [J]. THIN SOLID FILMS, 1979, 64 (03) : 455 - 467

[7] Toth L.E, 1971, TRANSITION METAL CAR

[1] PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION [J]. THIN SOLID FILMS, 1980, 72 (03) : 535 - 540

[2] LAENG P, 1981, 8TH P INT C CHEM VAP, P723

[3] ADHESION STUDIES OF ION-PLATED TIN ON STEEL [J]. THIN SOLID FILMS, 1981, 81 (04) : 357 - 366

[4] THE ADHESION OF CHEMICALLY VAPOUR-DEPOSITED HARD COATINGS TO STEEL - THE SCRATCH TEST [J]. THIN SOLID FILMS, 1981, 78 (01) : 77 - 93

[5] PERRY AJ, 1981, 8TH P INT C CHEM VAP, P475

[6] ADVANCES IN HIGH-RATE SPUTTERING WITH MAGNETRON-PLASMATRON PROCESSING AND INSTRUMENTATION [J]. THIN SOLID FILMS, 1979, 64 (03) : 455 - 467

[7] Toth L.E, 1971, TRANSITION METAL CAR