ADVANCES IN HIGH-RATE SPUTTERING WITH MAGNETRON-PLASMATRON PROCESSING AND INSTRUMENTATION

被引：42

作者：

SCHILLER, S

HEISIG, U

GOEDICKE, K

SCHADE, K

TESCHNER, G

HENNEBERGER, J

机构：

[1] VEB ELEKTROMAT DRESDEN, DRESDEN, GER DEM REP

[2] KOMBINAT KWH HERMSDORF, HERMSDORF, GER DEM REP

来源：

THIN SOLID FILMS | 1979年 / 64卷 / 03期

关键词：

D O I：

10.1016/0040-6090(79)90330-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Magnetron-plasmatron sputter sources have brought about a revolution in vacuum coating. After a concise review of source development a report is given on the state of metal sputtering. Today, process development is concentrated on the production of compounds by reactive d.c. sputtering. We discuss approaches to and results obtained with reactive high rate d.c. sputtering and give a summary of the equipment used in this field, particularly modular designs. Within a wide range of applications, coating jobs in electronics are of top priority. Further fields of use include hard material coatings and the coating of plastics. © 1979.

引用

页码：455 / 467

页数：13

共 45 条

[1]

ARDENNE MV, 1962, TAB ANGEW PHYS, V1, P658

[2]

ARONSON AI, 1976, 2ND C ION PLAT NIC

[3] MAGNETRON DC REACTIVE SPUTTERING OF TITANIUM NITRIDE AND INDIUM-TIN OXIDE [J].

CLARKE, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :141-142

[4]

DENISON DR, 1977, REP PERKIN ELMER ULT

[5]

Fraser D. B., 1978, THIN FILM PROCESSES

[6] FILM DEPOSITION WITH SPUTTER GUN [J].

FRASER, DB ;

COOK, HD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :147-151

[7]

FULLER CR, 1979, 6TH INT VAC MET C SA

[8] HIGH-RATE SPUTTERING OF ENHANCED ALUMINUM MIRRORS [J].

HARTSOUGH, LD ;

MCLEOD, PS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :123-126

[9]

HAUSSLER G, 1979, 6TH INT VAC MET C SA

[10]

HEISIG U, 1976, 7TH P INT S EL ION B, P129

← 1 2 3 4 5 →