SYNTHESIS OF COMPOUND THIN-FILMS BY DUAL ION-BEAM DEPOSITION .1. EXPERIMENTAL APPROACH

被引：69

作者：

HARPER, JME

CUOMO, JJ

HENTZELL, HTG

机构：

来源：

关键词：

D O I：

10.1063/1.335661

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：550 / 555

页数：6

共 22 条

[1] MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES
AFFINITO, J
PARSONS, RR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03): : 1275 - 1284
[2] BELYI IM, 1978, PHYS STATUS SOLIDI A, V45, P343
[3] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[4] NITRIDE FILM DEPOSITION BY REACTIVE ION-BEAM SPUTTERING
ERLER, HJ
REISSE, G
WEISSMANTEL, C
[J]. THIN SOLID FILMS, 1980, 65 (02) : 233 - 245
[5] REACTIVE DEPOSITION OF LOW-LOSS AL2O3 OPTICAL-WAVEGUIDES BY MODIFIED DC PLANAR MAGNETRON SPUTTERING
ESTE, G
WESTWOOD, WD
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03): : 1238 - 1247
[6] COMBINED ION-BEAM DEPOSITION AND ETCHING FOR THIN-FILM STUDIES
HARPER, JME
GAMBINO, RJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1901 - 1905
[7] QUANTITATIVE ION-BEAM PROCESS FOR THE DEPOSITION OF COMPOUND THIN-FILMS
HARPER, JME
CUOMO, JJ
HENTZELL, HTG
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (06) : 547 - 549
[8] SYNTHESIS OF COMPOUND THIN-FILMS BY DUAL ION-BEAM DEPOSITION .2. PROPERTIES OF ALUMINUM-NITROGEN FILMS
HENTZELL, HTG
HARPER, JME
CUOMO, JJ
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) : 556 - 563
[9] HENTZELL HTG, 1984, MATER RES SOC S P, V27, P519
[10] KATAJIMA M, 1981, J ELECTROCHEM SOC, V128, P1588