MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES

被引：123

作者：

AFFINITO, J

PARSONS, RR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1984年 / 2卷 / 03期

关键词：

D O I：

10.1116/1.572395

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1275 / 1284

页数：10

共 25 条

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