PREPARATION OF AIN COATINGS ON MO BY RF-REACTIVE ION PLATING - THE DEPOSITION MECHANISM

被引:11
作者
KITAJIMA, M
FUKUTOMI, M
OKADA, M
WATANABE, R
机构
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D O I
10.1149/1.2127688
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:1588 / 1595
页数:8
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