QUANTITATIVE ION-BEAM PROCESS FOR THE DEPOSITION OF COMPOUND THIN-FILMS

被引：111

作者：

HARPER, JME

CUOMO, JJ

HENTZELL, HTG

机构：

来源：

关键词：

D O I：

10.1063/1.94414

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：547 / 549

页数：3

共 5 条

[1] NITRIDE FILM DEPOSITION BY REACTIVE ION-BEAM SPUTTERING [J].

ERLER, HJ ;

REISSE, G ;

WEISSMANTEL, C .

[2] COMBINED ION-BEAM DEPOSITION AND ETCHING FOR THIN-FILM STUDIES [J].

HARPER, JME ;

GAMBINO, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1901-1905

HARPER, JME ;

CUOMO, JJ ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756

KAUFMAN, HR ;

CUOMO, JJ ;

HARPER, JME .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :725-736

[5] REACTIVE FILM PREPARATION [J].

WEISSMANTEL, C .