COMBINED ION-BEAM DEPOSITION AND ETCHING FOR THIN-FILM STUDIES

被引：45

作者：

HARPER, JME

GAMBINO, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570324

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1901 / 1905

页数：5

共 17 条

[1] INFLUENCE OF BIAS ON DEPOSITION OF METALLIC-FILMS IN RF AND DC SPUTTERING
CUOMO, JJ
GAMBINO, RJ
ROSENBER.R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 34 - 40
[2] SELECTIVE RESPUTTERING INDUCED ANISOTROPY IN AMORPHOUS FILMS
GAMBINO, RJ
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 296 - 301
[3] EFFECT OF ION IRRADIATION ON ADHERENCE OF GERMANIUM FILMS
HIRSCH, EH
VARGA, IK
[J]. THIN SOLID FILMS, 1978, 52 (03) : 445 - 452
[4] AUGER STUDY OF PREFERRED SPUTTERING ON BINARY ALLOY SURFACES
HO, PS
LEWIS, JE
WILDMAN, HS
HOWARD, JK
[J]. SURFACE SCIENCE, 1976, 57 (01) : 393 - 405
[5] AUGER STUDY OF PREFERRED SPUTTERING ON AG-AU ALLOY SURFACES
HO, PS
LEWIS, JE
HOWARD, JK
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 322 - 325
[6] TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING
KAUFMAN, HR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 272 - 276
[7] FOCUSED ION-BEAM DESIGNS FOR SPUTTER DEPOSITION
KAUFMAN, HR
HARPER, JME
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 179 - 180
[8] FOCUSED ION-BEAM DESIGNS FOR SPUTTER DEPOSITION
KAUFMAN, HR
HARPER, JME
CUOMO, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (03): : 899 - 905
[9] ATTEMPT TO UNDERSTAND PREFERENTIAL SPUTTERING
KELLY, R
[J]. NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3): : 553 - 558
[10] HOMOGENEITY OF AMORPHOUS GD-CO FILMS PREPARED BY BIAS SPUTTERING
KNAPPE, B
MULLER, HR
SPRINGMANN, B
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 47 (02): : 523 - 532

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