THE EFFECTS OF SUBSTRATE BIAS ON THE STRUCTURAL AND ELECTRICAL-PROPERTIES OF TIN FILMS PREPARED BY REACTIVE RF SPUTTERING

被引:94
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IGASAKI, Y
MITSUHASHI, H
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10.1016/0040-6090(80)90407-1
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T [工业技术];
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08 ;
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页码:17 / 25
页数:9
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