PLASMA-DEVELOPED ION-IMPLANTED RESISTS WITH SUB-MICRON RESOLUTION

被引：37

作者：

VENKATESAN, T

TAYLOR, GN

WAGNER, A

WILKENS, B

BARR, D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571214

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1379 / 1384

页数：6

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