A UNIVERSAL HIGH-CURRENT IMPLANTER FOR SURFACE MODIFICATION OF MATERIALS

被引：27

作者：

NIELSEN, BR

ABRAHAMSEN, P

ERIKSEN, S

机构：

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1989年 / 116卷

关键词：

D O I：

10.1016/0921-5093(89)90145-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：193 / 196

页数：4

共 10 条

[1]

EMIG H, 1989, MATER SCI ENG A, V116, P205

[2]

GRABOWSKI KS, 1983, 4TH P INT C ION IMPL, P364

[3]

Keller R., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P25

[4] METAL BEAM PRODUCTION USING A HIGH-CURRENT ION-SOURCE [J].