PLASMA RESONANCE RADIATION OF THIN SILVER FILMS

被引：4

作者：

POKROWSKY, P

RAETHER, H

机构：

来源：

SURFACE SCIENCE | 1979年 / 83卷 / 02期

关键词：

D O I：

10.1016/0039-6028(79)90054-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：423 / 438

页数：16

共 15 条

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[2] PLASMARESONANZSTRAHLUNG VON SILBER [J].

BRAMBRING, J ;

RAETHER, H .

ZEITSCHRIFT FUR PHYSIK, 1967, 199 (01) :118-+

[3] PLASMA RESONANCE ABSORPTION IN THIN METAL FILMS [J].

HATTORI, M ;

YAMADA, K ;

SUZUKI, H .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1963, 18 (02) :203-&

[4]

KRETCHMANN E, 1970, Z PHYS, V237, P1

[5]

KRETSCHM.E, 1967, Z NATURFORSCH PT A, VA 22, P1623

[6] DETERMINATION OF SURFACE-ROUGHNESS OF THIN-FILMS USING MEASUREMENT OF ANGULAR-DEPENDENCE OF SCATTERED LIGHT FROM SURFACE PLASMA-WAVES [J].

KRETSCHMANN, E .

OPTICS COMMUNICATIONS, 1974, 10 (04) :353-356

[7] REFLECTION AND TRANSMISSION OF LIGHT BY A ROUGH SURFACE, INCLUDING RESULTS FOR SURFACE-PLASMON EFFECTS [J].

KRETSCHMANN, E ;

KROGER, E .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1975, 65 (02) :150-154

[8]

Kretschmann E., 1972, Optics Communications, V6, P185, DOI 10.1016/0030-4018(72)90224-6

[9]

MCALISTER AI, 1963, PHYS REV, V132, P1959

[10]

POKROWSKY P, 1979, VAKUUM TECHNIK, V7

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