FLUORESCENCE BEHAVIOR OF DIAZONAPHTHOQUINONE-TYPE PHOTORESIST MATERIALS

被引：5

作者：

VLEGGAAR, JJM ^{[1
]}

HUIZER, AH ^{[1
]}

VARMA, CAGO ^{[1
]}

KRAAKMAN, PA ^{[1
]}

NIJSSEN, WPN ^{[1
]}

VISSER, RJ ^{[1
]}

机构：

[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 03期

关键词：

D O I：

10.1116/1.586774

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Photolysis of substituted diazo-naphthoquinones (DNQs) in the presence of H2O, yields the corresponding indene carboxylic acids as main products. HPLC analysis reveals that, depending on the matrix or the solvent, up to 20% of the DNQ may be converted into other photoproducts. Their nature and the mechanism involved in their formation is discussed. The side products are strongly fluorescent, and their fluorescence bands overlap with the first UV absorption band of the DNQ. Photolysis of DNQs by this fluorescence may affect the spatial resolution in photolithographic applications based on these photoactive compounds. Numerical calculations are presented, in which the spatial dependence of the magnitude of this effect is simulated. The calculations show that the conversion of DNQ in a photoresist layer, due to fluorescence, is in the order of a few percent of the total at most. In practice the fluorescence will have a negligible effect on the resolution.

引用

页码：688 / 698

页数：11

共 28 条

[1] ON THE PHOTODECOMPOSITION MECHANISM OF ORTHO-DIAZONAPHTHOQUINONES [J].