EPITAXIAL GROWTH OF FILMS ON SUBSTRATES COATED WITH AMORPHOUS DEPOSITS

被引：28

作者：

CHOPRA, KL

机构：

[1] Ledgemont Laboratory, Kennecott Copper Corporation, Lexington

来源：

JOURNAL OF APPLIED PHYSICS | 1969年 / 40卷 / 02期

关键词：

D O I：

10.1063/1.1657493

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

[No abstract available]

引用

页码：906 / &

共 13 条

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[2]

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[5]

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[9] CONTROLLED CRYSTALLINE ORIENTATION OF SPUTTERED FERROMAGNETIC FILMS ON AMORPHOUS SUBSTRATES [J].

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[10] THE STUDY OF EPITAXY IN THIN SURFACE FILMS [J].

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