HYDROTHERMAL EPITAXY OF HIGHLY ORIENTED TIO2 THIN-FILMS ON SILICON

被引：55

作者：

CHEN, QW

QIAN, YT

CHEN, ZY

WU, WB

CHEN, ZW

ZHOU, GE

ZHANG, YH

机构：

[1] UNIV SCI & TECHNOL CHINA,ACAD SINICA,STRUCT RES LAB,HEFEI 230026,PEOPLES R CHINA

[2] CTR ADV STUDIES SCI & TECHNOL MICROSTRUCT,NANJING 210093,PEOPLES R CHINA

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 13期

关键词：

D O I：

10.1063/1.113867

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly oriented thin films (0.15 μm) of titania on Si (100) substrates have been prepared first by hydrothermal treatment of TiO42- solution (0.6-1.2M) at relatively low temperatures. Films made at 100-200°C contain only the anatase phase with (112) orientation, adhere well to the substrates. The hydrothermal temperature, time, and the pH value of TiO42- solution are the critical parameters determining the formation of films.© 1995 American Institute of Physics.

引用

页码：1608 / 1610

页数：3

共 20 条

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