EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES

被引：47

作者：

DEMIRYONT, H

SITES, JR

机构：

[1] Colorado State Univ, Physics Dep,, Fort Collins, CO, USA, Colorado State Univ, Physics Dep, Fort Collins, CO, USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 04期

关键词：

D O I：

10.1116/1.572383

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1457 / 1460

页数：4

共 6 条

[1] DEMIRYONT H, UNPUB NBS SPECIAL PU
[2] HSU LS, 1984, UNPUB APPL OPT
[3] Kaufman H.R., 1975, Advances in Electronics and Electron Physics, V36, P265
[4] PAK S, 1980, REV SCI INSTRUM, V51, P536, DOI 10.1063/1.1136231
[5] X-RAY PHOTOELECTRON-SPECTROSCOPY OF ION-BEAM SPUTTER DEPOSITED SIO2, TIO2, AND TA2O5
ROSSNAGEL, SM
SITES, JR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 376 - 379
[6] ION-BEAM SPUTTER DEPOSITION OF OPTICAL COATINGS
SITES, JR
GILSTRAP, P
RUJKORAKARN, R
[J]. OPTICAL ENGINEERING, 1983, 22 (04) : 447 - 449