X-RAY PHOTOELECTRON-SPECTROSCOPY OF ION-BEAM SPUTTER DEPOSITED SIO2, TIO2, AND TA2O5

被引:49
作者
ROSSNAGEL, SM [1 ]
SITES, JR [1 ]
机构
[1] COLORADO STATE UNIV,DEPT PHYS,FT COLLINS,CO 80523
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期
关键词
D O I
10.1116/1.572746
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:376 / 379
页数:4
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