共 19 条
- [2] COMBINED SIMS, AES, AND XPS INVESTIGATIONS OF TANTALUM OXIDE LAYERS [J]. APPLIED PHYSICS, 1979, 18 (02): : 113 - 117
- [3] MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 349 - 354
- [4] LOCAL ATOMIC AND ELECTRONIC-STRUCTURE OF OXIDE-GAAS AND SIO2-SI INTERFACES USING HIGH-RESOLUTION XPS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05): : 1443 - 1453
- [5] INITIAL-STAGE OF SPUTTERING IN SILICON-OXIDE [J]. APPLIED PHYSICS LETTERS, 1983, 42 (03) : 244 - 246
- [8] AN XPS STUDY OF THE INFLUENCE OF ION SPUTTERING ON BONDING IN THERMALLY GROWN SILICON DIOXIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 43 - 47
- [9] ESCA STUDIES ON CHANGES IN SURFACE COMPOSITION UNDER ION-BOMBARDMENT [J]. APPLIED PHYSICS, 1977, 12 (01): : 101 - 112
- [10] Kaufman H.R., 1974, ADV ELECT ELECT PHYS, V36, P265