AN XPS STUDY OF THE INFLUENCE OF ION SPUTTERING ON BONDING IN THERMALLY GROWN SILICON DIOXIDE

被引:74
作者
HOFMANN, S [1 ]
THOMAS, JH [1 ]
机构
[1] RCA CORP LABS,DAVID SARNOFF RES CTR,PRINCETON,NJ 08540
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 01期
关键词
D O I
10.1116/1.582540
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SILICA
引用
收藏
页码:43 / 47
页数:5
相关论文
共 29 条
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