MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION

被引：139

作者：

CUOMO, JJ ^{[1
]}

HARPER, JME ^{[1
]}

GUARNIERI, CR ^{[1
]}

YEE, DS ^{[1
]}

ATTANASIO, LJ ^{[1
]}

ANGILELLO, J ^{[1
]}

WU, CT ^{[1
]}

HAMMOND, RH ^{[1
]}

机构：

[1] STANFORD UNIV,HANSEN PHYS LAB,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期

关键词：

D O I：

10.1116/1.571462

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：349 / 354

页数：6

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