MODIFICATION OF EVAPORATED CHROMIUM BY CONCURRENT ION-BOMBARDMENT

被引：141

作者：

HOFFMAN, DW

GAERTTNER, MR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 01期

关键词：

D O I：

10.1116/1.570473

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：425 / 428

页数：4

共 19 条

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[2] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS
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[3] DUDONIS J, 1979, THIN SOLID FILMS, V58, P106, DOI 10.1016/0040-6090(79)90218-9
[4] STRESS IN ION-IMPLANTED CVD SI3N4 FILMS
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[5] ION-ENHANCED FILM BONDING
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[6] COMPRESSIVE STRESS AND INERT-GAS IN MO FILMS SPUTTERED FROM A CYLINDRICAL POST MAGNETRON WITH NE, AR, KR, AND XE
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01): : 380 - 383
[7] INTERNAL-STRESSES IN SPUTTERED CHROMIUM
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THORNTON, JA
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 355 - 363
[8] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES
HOFFMAN, DW
THORNTON, JA
[J]. THIN SOLID FILMS, 1977, 45 (02) : 387 - 396
[9] EFFECTS OF SUBSTRATE ORIENTATION AND ROTATION ON INTERNAL-STRESSES IN SPUTTERED METAL-FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 134 - 137
[10] HOFFMAN DW, 1979, SAE790217 TECHN PAP