INTERNAL-STRESSES IN SPUTTERED CHROMIUM

被引：201

作者：

HOFFMAN, DW

THORNTON, JA

机构：

[1] FORD MOTOR CO,RES STAFF,DEARBORN,MI 48121

[2] TELIC CORP,SANTA MONICA,CA 90404

来源：

THIN SOLID FILMS | 1977年 / 40卷 / JAN期

关键词：

D O I：

10.1016/0040-6090(77)90137-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：355 / 363

页数：9

共 18 条

[1] STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD [J].

BLACHMAN, AG .

METALLURGICAL TRANSACTIONS, 1971, 2 (03) :699-&

[2] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].

BLAND, RD ;

KOMINIAK, GJ ;

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674

[3]

FINEGAN JD, 1961, 8TH T NAT VAC S, P935

[4]

GLANG R, 1965, 3 T INT VAC C 3, V2, P643

[5]

HOFFMAN RW, 1966, PHYSICS THIN FILMS, V3, P247

[6] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J].

KLOKHOLM, E ;

BERRY, BS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (08) :823-&

[7]

KUBASCHEWSKI O, 1967, METALLURGICAL THERMO, P371

[8]

Lee C. C., 1970, PROGR PHYS ORG CHEM, V7, P129

[9] ARGON ENTRAPMENT IN METAL-FILMS BY DC TRIODE SPUTTERING [J].

LEE, WWY ;

OBLAS, D .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1728-1732

[10]

MOREY GW, 1938, PROPERTIES GLASS, P23

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