EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS

被引：190

作者：

BLAND, RD ^{[1
]}

KOMINIAK, GJ ^{[1
]}

MATTOX, DM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：671 / 674

页数：4

共 12 条

[1] Bockris J.O.M., 1970, MODERN ELECTROCHEMIS
[2] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES
BUNSHAH, RF
JUNTZ, RS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1404 - &
[3] CULBERTON R, 1966, 8TH C TUB TECHN IEEE, P101
[4] MICROSTRUCTURE OF SPUTTER-DEPOSITED 304L STAINLESS STEEL
DAHLGREN, SD
MCCLANAHAN, ED
JOHNSTON, JW
GRAYBEAL, AG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (03): : 398 - +
[5] HOLMAN WR, 1967, P C CHEM VAPOR DEPOS, P127
[6] Kennedy K., 1968, T INT VACUUM METALLU, P195
[7] PHYSICAL PROPERTIES OF THICK SPUTTER-DEPOSITED GLASS FILMS
MATTOX, DM
KOMINIAK, GJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) : 1535 - 1539
[8] INCORPATION OF HELIUM IN DEPOSITED GOLD FILMS
MATTOX, DM
KOMINIAK, GJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (01): : 194 - +
[9] FUNDAMENTALS OF ION PLATING
MATTOX, DM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 47 - 52
[10] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION
MATTOX, DM
KOMINIAK, GJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 528 - &