COMBINED SIMS, AES, AND XPS INVESTIGATIONS OF TANTALUM OXIDE LAYERS

被引：26

作者：

BISPINCK, H

GANSCHOW, O

WIEDMANN, L

BENNINGHOVEN, A

机构：

来源：

APPLIED PHYSICS | 1979年 / 18卷 / 02期

关键词：

D O I：

10.1007/BF00934404

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：113 / 117

页数：5

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