USE OF METHOD OF SUCCESSIVE DILUTION FOR REPRODUCIBLE CONTROL OF AL-CU ALLOY EVAPORATION

被引：2

作者：

HECHT, LC ^{[1
]}

机构：

[1] IBM CORP,ENDICOTT,NY 13760

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569170

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：648 / 650

页数：3

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[2] THEORY OF STEADY-STATE EVAPORATION OF ALLOYS [J].

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[3]

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DHEURLE, FM .

METALLURGICAL TRANSACTIONS, 1971, 2 (03) :683-&

[5]

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[6]

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MCCARTHY, J .

[8] VACUUM DEPOSITION OF TIN-SELENIUM FILMS [J].

TERADA, T .

[9]

ZINSMEISTER G, 1963, VAK TECH, V8, P233