FAILURE OF ALUMINIUM CONTACTS TO SILICON IN SHALLOW DIFFUSED TRANSISTORS

[1] BLACK JR, 1968, J ELECTROCHEM SOC, V115, pC242

[2] ELECTROMIGRATION IN THIN AL FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) : 485 - &

[3] CRATCHLEY D, 1967, B AM CERAM SOC, V46, P191

[4] FISHER AW, 1966, J ELECTROCHEM SOC, V113, P1054

[5] STACKING FAULTS IN ANNEALED SILICON SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 360 - &

[6] SELLO H, 1968, J ELECTROCHEM SOC, V115, pC242

[7] FAILURE MODES OF INTEGRATED CIRCUITS AND THEIR RELATIONSHIP TO RELIABILITY [J]. MICROELECTRONICS RELIABILITY, 1968, 7 (03) : 257 - &

[1] BLACK JR, 1968, J ELECTROCHEM SOC, V115, pC242

[2] ELECTROMIGRATION IN THIN AL FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) : 485 - &

[3] CRATCHLEY D, 1967, B AM CERAM SOC, V46, P191

[4] FISHER AW, 1966, J ELECTROCHEM SOC, V113, P1054

[5] STACKING FAULTS IN ANNEALED SILICON SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 360 - &

[6] SELLO H, 1968, J ELECTROCHEM SOC, V115, pC242

[7] FAILURE MODES OF INTEGRATED CIRCUITS AND THEIR RELATIONSHIP TO RELIABILITY [J]. MICROELECTRONICS RELIABILITY, 1968, 7 (03) : 257 - &