DEPOSITION OF PLANARIZED DIELECTRIC LAYERS BY BIASED SPUTTER DEPOSITION

被引：6

作者：

SINGH, B

MESKER, O

DEVLIN, D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 02期

关键词：

D O I：

10.1116/1.583950

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：567 / 574

页数：8

共 20 条

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