PLANARIZATION BY RADIO-FREQUENCY BIAS SPUTTERING OF ALUMINUM AS STUDIED EXPERIMENTALLY AND BY COMPUTER-SIMULATION

被引：28

作者：

BADER, HP

LARDON, MA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.573272

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2167 / 2171

页数：5

共 30 条

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