NATURE OF DOPING INTO PURE SILICA GLASS BY PLASMA TORCH CVD

被引：32

作者：

ARAI, K ^{[1
]}

NAMIKAWA, H ^{[1
]}

ISHII, Y ^{[1
]}

IMAI, H ^{[1
]}

HOSONO, H ^{[1
]}

ABE, Y ^{[1
]}

机构：

[1] NAGOYA INST TECHNOL,DEPT INORGAN CHEM,SHOWA KU,NAGOYA,AICHI 466,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 95-6卷

关键词：

D O I：

10.1016/S0022-3093(87)80164-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：609 / 616

页数：8

共 18 条

[1] FLUORESCENCE AND ITS ND-3+ CONCENTRATION-DEPENDENCE OF ND-DOPED SIO2 GLASSES PREPARED BY PLASMA TORCH CVD
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[2] ALUMINUM OR PHOSPHORUS CO-DOPING EFFECTS ON THE FLUORESCENCE AND STRUCTURAL-PROPERTIES OF NEODYMIUM-DOPED SILICA GLASS
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[J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (10) : 3430 - 3436
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[4] IMAI H, IN PRESS PHYS CHEM G
[5] IMAI H, 1987, IN PRESS JUN P INT C
[6] PREPARATION OF CERIUM-ACTIVATED SILICA GLASSES - PHOSPHORUS AND ALUMINUM CODOPING EFFECTS ON ABSORPTION AND FLUORESCENCE PROPERTIES
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[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1987, 70 (02) : 72 - 77
[7] ISHII Y, 1985, J CERAM SOC JPN, V93, P498
[8] STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
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[9] INDUCED-EMISSION CROSS-SECTIONS IN NEODYMIUM LASER GLASSES
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[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1974, QE10 (04) : 450 - 457
[10] PREPARATION OF ND-DOPED SIO2 GLASS BY PLASMA TORCH CVD
NAMIKAWA, H
ARAI, K
KUMATA, K
ISHII, Y
TANAKA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (06): : L360 - L362

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