STRUCTURAL TRANSFORMATIONS INDUCED DURING THE ANNEALING OF THIN NI-CR FILMS

被引：9

作者：

BIRJEGA, MI

POPESCUPOGRION, N

SARBU, C

TEODORESCU, IA

机构：

[1] Central Institute of Physics, Institute of Physics and Technology of Materials, Bucharest-Magurele

来源：

THIN SOLID FILMS | 1979年 / 57卷 / 02期

关键词：

D O I：

10.1016/0040-6090(79)90175-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present curves describing the variation of the electrical resistance during the in situ annealing of NiCr thin films containing various amounts of chromium and grown at various rates. The results of electron microscopy and electron diffraction investigations of the annealed NiCr thin films are also reported and the structural transformations taking place during the annealing treatment are determined. © 1979.

引用

页码：337 / 341

页数：5

共 16 条

[1]

BAER HG, 1958, Z METALLKD, V49, P614

[2]

BICKNELL RW, 1965, BR J APPL PHYS, V16, P17

[3]

BIRJEGA MI, 1979, REV ROUM PHYS, V24, P107

[4] METASTABLE PHASES IN VACUUM-EVAPORATED CR-NI THIN-FILMS [J].