THE DEPENDENCE OF COATING IN INDUCTIVE RF PLASMAS ON GAS-FLOW VELOCITY, PRESSURE AND RF POWER

被引：17

作者：

KHAIT, YL ^{[1
]}

INSPEKTOR, A ^{[1
]}

AVNI, R ^{[1
]}

机构：

[1] NUCL RES CTR NEGEV,DIV CHEM,BEERSHEBA,ISRAEL

来源：

THIN SOLID FILMS | 1980年 / 72卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90006-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：249 / 260

页数：12

共 17 条

[1]

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[3]

CARMI U, 1978, KFA1499RW KERN FORSC

[4]

CARMI U, 1980, THESIS B GURION U BE

[5]

CHEM FF, 1965, PLASMA DIAGNOSTICS T, pCH4

[6] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J].

DAVIS, WD ;

VANDERSLICE, TA .

PHYSICAL REVIEW, 1963, 131 (01) :219-&

[7]

DELLE W, 1979, GRAPHITE MATERIALS 1

[8] CHARACTERIZATION OF PYROLYTIC CARBON DEPOSITED ON GRAPHITE SUBSTRATES IN INDUCTIVE RF-PLASMAS OF PROPYLENE AND ARGON [J].

INSPEKTOR, A ;

HORNIK, Y ;

CARMI, U ;

AVNI, R ;

WALLURA, E ;

HOVEN, H ;

KOIZLIK, K ;

NICKEL, H .

THIN SOLID FILMS, 1980, 72 (01) :195-200

[9]

INSPEKTOR A, 1979, 4TH INT S PLASM CHEM, V2, P390

[10] SPUTTERING PROCESS MODEL OF DEPOSITION RATE [J].

KELLER, JH ;

SIMMONS, RG .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) :24-32

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