INTERPRETATION AND CONTROL OF C-V MEASUREMENTS USING PATTERN-RECOGNITION AND EXPERT SYSTEM TECHNIQUES

被引：5

作者：

WALLS, JA

WALTON, AJ

ROBERTSON, JM

机构：

[1] Digital Equipment Scotland, Ltd., Headrig Road, South Queensferry

[2] Edinburgh Microfabrication Facility, Department of Electrical Engineering, The Kings’ Buildings, Mayfield Road, Edinburgh

来源：

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 1991年 / 4卷 / 03期

关键词：

D O I：

10.1109/66.85947

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pattern-recognition and knowledge-based techniques have been applied to help extract the maximum amount of information from C-V measurements. This has been implemented by integrating conventional, algorithmic instrument control software with an expert system shell to intelligently sequence tests to enhance conventional CV, GV, C-t, and QSCV measurements. This approach ensures that the measurement sequence is appropriately tailored to the particular characteristics of the MOS capacitor test structure under investigation.

引用

页码：250 / 262

页数：13

共 24 条

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