3 TO 15 KEV AR+ INDUCED AUGER-ELECTRON EMISSION FROM SI AND AR

[1] EXTENSION OF ELECTRON-PROMOTION MODEL TO ASYMMETRIC ATOMIC COLLISION [J]. PHYSICAL REVIEW A, 1972, 6 (01): : 211 - &

[2] BENAZETH C, 1973, CR ACAD SCI B PHYS, V276, P863

[3] INFLUENCE OF SPUTTERING, RANGE SHORTENING AND STRESS-INDUCED OUT-DIFFUSION ON RETENTION OF XENON IMPLANTED IN SILICON [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 387 - 392

[4] Carter G., 1968, ION BOMBARDMENT SOLI

[5] CASTAING R, 1971, ADV MASS SPECTROM, V5, P419

[6] SURFACE COMPOSITIONAL ANALYSIS USING LOW ENERGY ION-BOMBARDMENT INDUCED EMISSION PROCESSES [J]. VACUUM, 1974, 24 (09) : 373 - 388

[7] INTERPRETATION OF AR+-AR COLLISIONS AT 50 KEV [J]. PHYSICAL REVIEW LETTERS, 1965, 14 (16) : 627 - &

[8] PRODUCTION OF NE AUGER ELECTRONS BY NE+ BOMBARDMENT OF MG AND AL SURFACES [J]. SURFACE SCIENCE, 1976, 57 (01) : 420 - 424

[9] GRANT JT, 1975, J VAC SCI TECHNOL, V12, P1

[10] GROENEVELD KO, 1974, VACUUM, V25, P1

[1] EXTENSION OF ELECTRON-PROMOTION MODEL TO ASYMMETRIC ATOMIC COLLISION [J]. PHYSICAL REVIEW A, 1972, 6 (01): : 211 - &

[2] BENAZETH C, 1973, CR ACAD SCI B PHYS, V276, P863

[3] INFLUENCE OF SPUTTERING, RANGE SHORTENING AND STRESS-INDUCED OUT-DIFFUSION ON RETENTION OF XENON IMPLANTED IN SILICON [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 387 - 392

[4] Carter G., 1968, ION BOMBARDMENT SOLI

[5] CASTAING R, 1971, ADV MASS SPECTROM, V5, P419

[6] SURFACE COMPOSITIONAL ANALYSIS USING LOW ENERGY ION-BOMBARDMENT INDUCED EMISSION PROCESSES [J]. VACUUM, 1974, 24 (09) : 373 - 388

[7] INTERPRETATION OF AR+-AR COLLISIONS AT 50 KEV [J]. PHYSICAL REVIEW LETTERS, 1965, 14 (16) : 627 - &

[8] PRODUCTION OF NE AUGER ELECTRONS BY NE+ BOMBARDMENT OF MG AND AL SURFACES [J]. SURFACE SCIENCE, 1976, 57 (01) : 420 - 424

[9] GRANT JT, 1975, J VAC SCI TECHNOL, V12, P1

[10] GROENEVELD KO, 1974, VACUUM, V25, P1