LOW-TEMPERATURE SPUTTER DEPOSITION OF HIGH-TC SUPERCONDUCTING NIOBIUM-GERMANIUM FILMS

被引：14

作者：

BUITRAGO, RH ^{[1
]}

TOTH, LE ^{[1
]}

GOLDMAN, AM ^{[1
]}

SCHWANEBECK, J ^{[1
]}

DAYAN, M ^{[1
]}

机构：

[1] UNIV MINNESOTA,SCH PHYS & ASTRON,MINNEAPOLIS,MN 55455

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 05期

关键词：

D O I：

10.1063/1.90016

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：341 / 343

页数：3

共 15 条

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[2]

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[3]

DAVIS LE, 1976, HDB AUGER ELECTRON S

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MILLER, JW ;

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[5] PROPERTIES OF SPUTTERED HIGH TC THIN-FILMS [J].

GAVALER, JR .

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[6] PREPARATION AND PROPERTIES OF HIGH-TC NB-GE FILMS [J].

GAVALER, JR ;

JANOCKO, MA ;

JONES, CK .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3009-3012

[7]

GAVALER JR, 1976, SUPERCONDUCTIVITY D, P421

[8] SYNTHESIS AND STABILITY OF NB3GE MADE BY ELECTRON-BEAM CODEPOSITION [J].

HALLAK, AB ;

HAMMOND, RH ;

GEBALLE, TH .

APPLIED PHYSICS LETTERS, 1976, 29 (05) :314-316

[9] PREPARATION OF HIGH TC NB3GE SUPERCONDUCTORS BY CHEMICAL VAPOR-DEPOSITION [J].

NEWKIRK, LR ;

VALENCIA, FA ;

WALLACE, TC .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (03) :425-429

[10]

POATE JM, 1976, SUPERCONDUCTIVITY D, P489

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