We have made a comparative study of the electrical field effect in both ultrathin (4.5nm), and comparatively thick (200 nm) polycrystalline YBa2Cu3O7-x films. In the first case SrTiO3 was used as gate insulator, and in the second case (Pb,Zr)TiO3. In the ultrathin film we increased and decreased the critical current up to 2.4%, by applying negative and positive voltages of 80V. In the polycrystalline film (Tc= 84.5K) we measured an increase of the normal resistance of 7%, when applying a gate voltage of +1.78V.