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QUASI-CW LASER AT 585.3-NM OF THE NE-I LINE IN NE-H2 MIXTURE IN A SIMPLE COAXIAL ALTERNATING HIGH-VOLTAGE GLOW-DISCHARGE
被引:15
作者:
GANCIU, M
SURMEIAN, A
DIPLASU, C
CHERA, I
MUSA, G
POPESCU, II
机构:
[1] Institute of Atomic Physics, IFTAR, Lab. 22, R-76900 Bucharest/ Magurele
关键词:
D O I:
10.1016/0030-4018(92)90060-5
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
A recombination Penning plasma laser operating at 585.3 nm of the Ne I line of an abnormal high-voltage glow discharge in a coaxial structure at 20-50 torr pressure of a Ne-H-2 mixture was achieved. The device can be operated either in a nanosecond monopulse mode or in an oscillatory mode. In the latter case we obtained a quasi-continuum, modulated laser light generation.
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页码:381 / 384
页数:4
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