DIFFERENCE IN LIGHT-INDUCED ANNEALING BEHAVIOR OF DEPOSITION-INDUCED DEFECTS IN HYDROGENATED AMORPHOUS-SILICON

被引:5
作者
HATA, N
MATSUDA, A
机构
[1] Electrotechnical Laboratory, Tsukuba-shi, Ibaraki 305
关键词
D O I
10.1063/1.110610
中图分类号
O59 [应用物理学];
学科分类号
摘要
First experimental results on light-induced annealing (LIA) of deposition-induced defects (DID) in hydrogenated amorphous silicon (a-Si:H) are reported. LIA of DID and of light-induced defects (LID) showed a big difference: the reduction in density of DID by LIA is as low as one third or less of LID reduced by LIA, while thermal annealing reduced DID and LID very similarly. Those results indicate a structural difference between DID and LID, and are discussed in connection with a structural model of a-Si:H.
引用
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页码:1948 / 1950
页数:3
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