REACTIVE DIFFUSION AND ELECTRONIC-STRUCTURE AT NICKEL-SELENIUM INTERFACE

被引：8

作者：

NIELSEN, P

RITSKO, JJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 02期

关键词：

D O I：

10.1063/1.324691

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：632 / 639

页数：8

共 25 条

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[5]

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