VAPOR-DEPOSITION OF POLY(ALKYL-2-CYANOACRYLATE) RESIST COATINGS - A NEW ELECTRON-BEAM DEEP-ULTRA-VIOLET PHOTORESIST TECHNOLOGY

被引：9

作者：

WOODS, J

GUTHRIE, J

ROONEY, J

KELLY, L

DOYLE, A

NOONAN, E

机构：

[1] LOCTITE CORP,NEWINGTON,CT

[2] NATL UNIV IRELAND UNIV COLL CORK,NATL MICROELECTR RES CTR,CORK,IRELAND

来源：

POLYMER | 1989年 / 30卷 / 06期

关键词：

D O I：

10.1016/0032-3861(89)90086-4

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：1091 / 1098

页数：8

共 21 条

[1]

Ardis A. E., 1949, U.S. Patent, Patent No. [2467927, 2,467,927]

[2]

Bowden M J, 1979, CRC CRIT R SOLID ST, V8, P223

[3]

COOVER HW, 1988, ENCY POLYM SCI ENG, V1, P299

[4]

CRONIN JP, 1988, MAKROMOL CHEM, V189, P85

[5]

DONNELLY EF, 1981, MAKROMOL CHEM-RAPID, V2, P439

[6]

DUNN DJ, 1977, J POLYM CHEM PL, V15, P399

[7] POLY(NORMAL-BUTYL ALPHA-CYANOACRYLATE) - A HIGHLY SENSITIVE AND HIGH CONTRAST RESIST FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY [J].

ERANIAN, A ;

DATAMANTI, E ;

DUBOIS, JC ;

SERRE, B ;

SCHUE, F ;

MONTGINOUL, C ;

GIRAL, L .

BRITISH POLYMER JOURNAL, 1987, 19 (3-4) :353-359

[8]

HERLBERT JN, 1977, J APPL POLYM SCI, V21, P797

[9]

JOHNSTON DS, 1981, MACROMOL CHEM PHYS, V182, P393

[10]

KOTZEV DL, 1986, DOKL BOLG AKAD NAUK, V39, P53

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