ROLE OF DC SELF-BIAS POTENTIAL IN CONTROL OF RF SPUTTERING

被引：22

作者：

LAMONT, LT ^{[1
]}

TURNER, FT ^{[1
]}

机构：

[1] VARIAN ASSOC,PALO ALTO,CA 94303

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 01期

关键词：

D O I：

10.1116/1.1318659

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：47 / 51

页数：5

共 8 条

[1] SUBSTRATE BOMBARDMENT DURING RF SPUTTERING
BRODIE, I
LAMONT, LT
MYERS, DO
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 124 - &
[2] Chopra K.L, 1969, THIN FILM PHENOMENA
[3] JACKSON GN, 1970, THIN SOLID FILMS, V5, P228
[4] SPACE CHARGE INSTABILITIES IN RF INDUCED GAS DISCHARGE OF DIODE CONFIGURATION
LAMONT, LT
DELEONE, JJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (01): : 155 - &
[5] ELECTRICAL CHARACTERIZATION OF RADIO-FREQUENCY SPUTTERING GAS DISCHARGE
LOGAN, JS
MAZZA, NM
DAVIDSE, PD
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 120 - &
[6] Maissel L.I., 1970, HDB THIN FILM TECHNO
[7] SAMS HW, 1970, REFERENCE DATA RADIO
[8] CALCULATION OF ION BOMBARDING ENERGY AND ITS DISTRIBUTION IN RF SPUTTERING
TSUI, RTC
[J]. PHYSICAL REVIEW, 1968, 168 (01): : 107 - &