BEHAVIOR OF MOS INVERSION LAYERS AT LOW TEMPERATURE

被引:34
作者
GOETZBER.A
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D O I
10.1109/T-ED.1967.16109
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:787 / &
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共 7 条
[1]  
GOETZBERGER A, 1966, APPL PHYS LETT, V9, P444
[2]  
GROSVALET J, 1967, IEEE T ELECTRON DEVI, VED14, P777
[3]   INVESTIGATION OF THERMALLY OXIDISED SILICON SURFACES USING METAL-OXIDE-SEMICONDUCTOR STRUCTURES [J].
GROVE, AS ;
DEAL, BE ;
SNOW, EH ;
SAH, CT .
SOLID-STATE ELECTRONICS, 1965, 8 (02) :145-+
[4]   PHYSICAL LIMITATIONS ON FREQUENCY RESPONSE OF A SEMICONDUCTOR SURFACE INVERSION LAYER [J].
HOFSTEIN, SR ;
WARFIELD, G .
SOLID-STATE ELECTRONICS, 1965, 8 (03) :321-+
[5]  
NICOLLIAN EH, 1965, IEEE T ELECTRON DEVI, VED12, P108
[6]   CARRIER GENERATION AND RECOMBINATION IN P-N JUNCTIONS AND P-N JUNCTION CHARACTERISTICS [J].
SAH, CT ;
NOYCE, RN ;
SHOCKLEY, W .
PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1957, 45 (09) :1228-1243
[7]  
ZERBST M, 1965, Z ANGEW PHYSIK, V19, P85