PARAMETERS AFFECTING SENSITIVITY OF POLY(METHYL METHACRYLATE) AS A POSITIVE LITHOGRAPHIC RESIST

被引：22

作者：

GIPSTEIN, E ^{[1
]}

OUANO, AC ^{[1
]}

JOHNSON, DE ^{[1
]}

NEED, OU ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

POLYMER ENGINEERING AND SCIENCE | 1977年 / 17卷 / 06期

关键词：

D O I：

10.1002/pen.760170613

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

收藏

页码：396 / 401

页数：6

相关论文

共 32 条

[1] Bowden M. J., 1975, J POLYM SCI POLYM S, V49, P221
[2] CHAPIRO A, 1962, RADIATION CHEMISTRY
[3] CHARLESBY A, 1960, ATOMIC RADIATION POL
[4] NOVEL METHOD FOR PREPARING POLY(ALKYL METHACRYLATES) AND POLY(METHACRYLIC ACIDS) OF VARYING TACTICITY
CHLANDA, FP
DONARUMA, LG
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1971, 15 (05) : 1195 - &
[5] Dole M., 1973, RAD CHEM MACROMOLECU, VII, P97
[6] SPATIAL CONFIGURATION OF MACROMOLECULAR CHAINS
FLORY, PJ
[J]. SCIENCE, 1975, 188 (4195) : 1268 - 1276
[7] CRYSTALLINE ACRYLIC POLYMERS .1. STEREOSPECIFIC ANIONIC POLYMERIZATION OF METHYL METHACRYLATE
GOODE, WE
OWENS, FH
FELLMANN, RP
SNYDER, WH
MOORE, JE
[J]. JOURNAL OF POLYMER SCIENCE, 1960, 46 (148): : 317 - 331
[8] HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE
HALLER, I
HATZAKIS, M
SRINIVASAN, R
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) : 251 - +
[9] POLYMETHYL METHACRYLATE AS AN ELECTRON SENSITIVE RESIST
HARRIS, RA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (02) : 270 - 274
[10] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION
HATZAKIS, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

← 1 2 3 4 →