3-DIMENSIONAL MICROANALYSIS USING A FOCUSED MEV OXYGEN ION-BEAM

被引：12

作者：

HORINO, Y ^{[1
]}

CHAYAHARA, A ^{[1
]}

SATOU, M ^{[1
]}

TAKAI, M ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 54卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(91)95524-H

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A focused MeV ion beam line for nearly any element has been developed by combining a focusing system with a beam line of a tandem-type accelerator. A minimum beam spot size of 5.6-mu-m x 8.0-mu-m has been obtained for 2 MeV O+ ions. This system has realized ion beam processing such as maskless MeV ion implantation and ion beam microanalysis by Rutherford backscattering (RBS) using heavy ions. RBS-mapping measurements of two- or three-dimensional structures with MeV heavy ions were demonstrated.

引用

页码：269 / 274

页数：6

共 13 条

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