FOCUSED HIGH-ENERGY HEAVY-ION BEAMS

被引：12

作者：

HORINO, Y ^{[1
]}

CHAYAHARA, A ^{[1
]}

KIUCHI, M ^{[1
]}

FUJII, K ^{[1
]}

SATOU, M ^{[1
]}

FUJIMOTO, F ^{[1
]}

机构：

[1] OSAKA UNIV,INST SCI & IND RES,IBARAKI,OSAKA 567,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 06期

关键词：

Focused ion beam; Ion microprobe; Mev ion beam; Mev ion implantation; Rbs;

D O I：

10.1143/JJAP.29.1230

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A focused ion beam line of MeV heavy ions has been developed by combining a focusing system consisting of objective slits and a magnetic quadrupole doublet to the beam line of a tand em-type accelerator. The demagnification factors of this system were determined to be 1/3.4 for the horizontal direction and 1/14 for the vertical direction, and a minimum beam spot size of 5.6 µm×8.0 µm was achieved. This system allows us ion beam processes such as maskless MeV ion implantation and ion beam microanalysis using heavy ions. © 1990 The Japan Society of Applied Physics.

引用

页码：1230 / 1233

页数：4

共 17 条

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