NOVEL APPLICATIONS OF OPTICAL TECHNIQUES TO THE STUDY OF BURIED SEMICONDUCTOR INTERFACES

被引：3

作者：

WILSON, BA ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1989年 / 25卷 / 05期

关键词：

D O I：

10.1109/3.27994

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1012 / 1017

页数：6

共 42 条

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