INVESTIGATIONS OF STRUCTURAL AND ELECTRICAL PROPERTIES OF DISCONTINUOUS GOLD FILMS CONDENSED ON SIO AND GLASS SUBSTRATES

被引：8

作者：

FREDRIKSSON, H

PERSSON, B

YSTROM, L

机构：

来源：

PHYSICA SCRIPTA | 1971年 / 3卷 / 3-4期

关键词：

D O I：

10.1088/0031-8949/3/3-4/011

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：169 / +

页数：1

共 22 条

[1] ELECTRICAL RESISTIVITY OF THIN SINGLE-CRYSTAL GOLD FILMS [J].

CHOPRA, KL ;

BOBB, LC ;

FRANCOMBE, MH .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) :1699-&

[2] INFLUENCE OF DEPOSITION PARAMETERS ON COALESCENCE STAGE OF GROWTH OF METAL FILMS [J].

CHOPRA, KL ;

RANDLETT, MR .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) :1874-&

[3] GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (09) :3405-&

[4] ELECTRICAL CONDUCTANCE OF THIN ULTRAHIGH-VACUUM-EVAPORATED FILMS OF TUNGSTEN ON GLASS [J].

DOBSON, PJ ;

HOPKINS, BJ .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (07) :3074-&

[5] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J].

DOVE, DB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2785-&

[6]

Forssell J., 1970, Physica Scripta, V2, P303, DOI 10.1088/0031-8949/2/6/010

[7]

GUNTHER KG, 1966, USE THIN FILMS PHYSI

[8] ELECTRICAL CONDUCTION BETWEEN METALLIC MICROPARTICLES [J].

HERMAN, DS ;

RHODIN, TN .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) :1594-&

[9]

IDCZAK E, 1968, PRZEGLAD ELEKTRON, V9, P326

[10] ELECTRICAL CONDUCTIVITY IN EVAPORATED SILICON OXIDE FILMS [J].

JOHANSEN, IT .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :499-&

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